標(biāo)準(zhǔn)解讀

GB/T 44221-2024 是一項關(guān)于光學(xué)系統(tǒng)波前像差測定的標(biāo)準(zhǔn)，具體采用了夏克-哈特曼（Sheard-Hartmann）光電測量法。這項標(biāo)準(zhǔn)為光學(xué)領(lǐng)域提供了統(tǒng)一的測試方法和評估準(zhǔn)則，確保了不同機構(gòu)間測量結(jié)果的一致性和可比性。下面是對該標(biāo)準(zhǔn)內(nèi)容的展開說明：

標(biāo)準(zhǔn)適用范圍

本標(biāo)準(zhǔn)規(guī)定了利用夏克-哈特曼傳感器來測量光學(xué)系統(tǒng)，包括但不限于相機鏡頭、顯微鏡、望遠(yuǎn)鏡及激光光學(xué)系統(tǒng)等的波前像差的方法。適用于評估這些系統(tǒng)在設(shè)計、生產(chǎn)、安裝以及維護(hù)過程中的光學(xué)性能。

夏克-哈特曼測量原理

夏克-哈特曼測量法基于一個由許多微小透鏡組成的陣列（夏克-哈特曼盤），當(dāng)被測光學(xué)系統(tǒng)的光束通過此陣列后，會在每個微透鏡的后焦面上形成一個光斑圖案。光斑的位置偏離中心表示波前的傾斜，而光斑的形狀變化則反映了局部曲率的偏差，從而可以計算出整個波前的像差分布。

測量設(shè)備與環(huán)境要求

標(biāo)準(zhǔn)詳細(xì)描述了所需測量設(shè)備的規(guī)格，包括但不限于夏克-哈特曼傳感器的分辨率、動態(tài)范圍及精度要求。同時，對測量環(huán)境的光照條件、溫度、濕度等也給出了具體要求，以減少外界因素對測量結(jié)果的影響。

測試步驟與數(shù)據(jù)處理

標(biāo)準(zhǔn)明確了從光學(xué)系統(tǒng)設(shè)置、測量準(zhǔn)備、數(shù)據(jù)采集到像差數(shù)據(jù)分析的全過程。這包括如何正確對準(zhǔn)被測光學(xué)系統(tǒng)，如何調(diào)整測量參數(shù)以獲得最佳信號質(zhì)量，以及采用何種算法來分析從夏克-哈特曼傳感器獲得的數(shù)據(jù)，進(jìn)而計算出各種像差（如球差、彗差、像散等）的大小。

評估與報告

標(biāo)準(zhǔn)指導(dǎo)用戶如何根據(jù)測量結(jié)果評估光學(xué)系統(tǒng)的性能，并提供了一套統(tǒng)一的報告格式。報告應(yīng)包含測試條件、所用設(shè)備信息、測量數(shù)據(jù)、像差圖示以及基于這些數(shù)據(jù)的性能評價指標(biāo)，便于用戶理解并比較不同光學(xué)系統(tǒng)的性能。

標(biāo)準(zhǔn)更新與兼容性

GB/T 44221-2024 標(biāo)準(zhǔn)注重與國際相關(guān)標(biāo)準(zhǔn)的協(xié)調(diào)一致，同時也考慮了技術(shù)進(jìn)步，為未來可能的技術(shù)升級留有接口，確保其長期的實用性和有效性。


如需獲取更多詳盡信息，請直接參考下方經(jīng)官方授權(quán)發(fā)布的權(quán)威標(biāo)準(zhǔn)文檔。

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文檔簡介

ICS17.180.99

CCSL50

中華人民共和國國家標(biāo)準(zhǔn)

GB/T44221—2024

光學(xué)系統(tǒng)波前像差的測定

夏克?哈特曼光電測量法

Determinationofwavefrontaberrationinopticalsystems—

Electro?opticalShack?Hartmannmethod

2024?07?24發(fā)布2025?02?01實施

國家市場監(jiān)督管理總局

國家標(biāo)準(zhǔn)化管理委員會發(fā)布

GB/T44221—2024

目次

前言··························································································································Ⅲ

1范圍·······················································································································1

2規(guī)范性引用文件········································································································1

3術(shù)語和定義··············································································································1

4測量原理及方法········································································································2

4.1測量原理···········································································································2

4.2光學(xué)系統(tǒng)波前像差測量方法···················································································2

4.3光學(xué)零件面形偏差的測量······················································································3

5測量條件·················································································································4

5.1測量環(huán)境···········································································································4

5.2樣品·················································································································4

6設(shè)備及裝置··············································································································4

6.1測量儀··············································································································4

6.2輔助鏡頭···········································································································5

7測量步驟·················································································································5

7.1測量前準(zhǔn)備········································································································5

7.2波前重構(gòu)方法的選擇····························································································6

7.3光路對準(zhǔn)···········································································································6

7.4測量與數(shù)據(jù)的判定·······························································································6

8測量數(shù)據(jù)處理···········································································································6

9測量報告·················································································································7

附錄A（資料性）波前復(fù)原方法·······················································································8

附錄B（資料性）Zernike多項式序列···············································································11

附錄C（資料性）測量報告····························································································13

參考文獻(xiàn)····················································································································14

Ⅰ

GB/T44221—2024

前言

本文件按照GB/T1.1—2020《標(biāo)準(zhǔn)化工作導(dǎo)則第1部分：標(biāo)準(zhǔn)化文件的結(jié)構(gòu)和起草規(guī)則》的規(guī)

定起草。

請注意本文件的某些內(nèi)容可能涉及專利。本文件的發(fā)布機構(gòu)不承擔(dān)識別專利的責(zé)任。

本文件由中國科學(xué)院提出。

本文件由全國光測量標(biāo)準(zhǔn)化技術(shù)委員會（SAC/TC487）歸口。

本文件起草單位：中國科學(xué)院蘇州生物醫(yī)學(xué)工程技術(shù)研究所、中國科學(xué)院光電技術(shù)研究所、中國標(biāo)

準(zhǔn)化研究院、中國科學(xué)院空天信息創(chuàng)新研究院、中國科學(xué)院長春光學(xué)精密機械與物理研究所、蘇州慧利

儀器有限責(zé)任公司、中國計量科學(xué)研究院、長春奧普光電技術(shù)股份有限公司、浙江舜宇光學(xué)有限公司、

成都科奧達(dá)光電技術(shù)有限公司、蘇州一光儀器有限公司、舟山市質(zhì)量技術(shù)監(jiān)督檢測研究院。

本文件主要起草人：史國華、邢利娜、何益、楊金生、蔡建奇、王璞、劉春雨、韓森、洪寶玉、馮長有、

包明帝、葉虹、謝桂華、伍開軍、沈晨雁、郝華東。

Ⅲ

GB/T44221—2024

光學(xué)系統(tǒng)波前像差的測定

夏克?哈特曼光電測量法

1范圍

本文件描述了采用夏克?哈特曼法測量光學(xué)系統(tǒng)波前像差的原理及方法、測量條件、設(shè)備及裝置、

測量步驟以及測量數(shù)據(jù)處理。

本文件適用于采用夏克?哈特曼法測量光學(xué)系統(tǒng)波前像差的測量，也適用于光學(xué)零件面形偏差的

測量。

2規(guī)范性引用文件

本文件沒有規(guī)范性引用文件。

3術(shù)語和定義

下列術(shù)語和定義適用于本文件。

3.1

波前wavefront

光波傳播時的等相位面。

[來源：GB/T13962—2009，2.28]

3.2

波前像差wavefrontaberration

Φ

波前與理想波前的偏差。

[來源：GB/T41869.2—2022，3.1，有修改]

3.3

面形偏差surfaceformdeviation

被測光學(xué)表面相對于參考光學(xué)表面的偏差。

[來源：GB/T2831—2009，3.1]

3.4

波前重構(gòu)wavefrontreconstruction

通過子孔徑的斜率計算得到入射波前的相位分

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