TFT-LCD制造流程及光學(xué)規(guī)格介紹--080527

1、P.1 TFT-LCD模組模組結(jié)構(gòu)組成結(jié)構(gòu)組成 TFT-LCD工作原理工作原理 TFT-LCD製作流程簡(jiǎn)介製作流程簡(jiǎn)介 TFT-LCD光學(xué)規(guī)格介紹光學(xué)規(guī)格介紹P.2Thin Film Transistor Liquid Crystal Display薄膜電晶體液晶顯示器薄膜電晶體液晶顯示器 The thin-film transistor liquid crystal display (TFT-LCD) is a cutting-edge display, which screens picture information by adjusting the amount of light pe

2、rmitted. TFT is a circuit formed with semiconductor films on a thin glass substrate to control liquid crystals. This circuit plays a vital role in controlling each pixel, the basic unit of a picture image. The color filter displays a color image by coating the pixel (red, green and blue) on a glass

3、substrate. P.3 Driver ICCellTFT-LCD panelBacklightFront viewBack viewX-PCBLamp ConnectorDriver ICTiming ControllerSignal InterfaceY-PCBLVDS receiverTFT-LCD模組模組結(jié)構(gòu)組成結(jié)構(gòu)組成P.4P.5P.6關(guān)于液晶關(guān)于液晶 18881888年，澳大利亞植物學(xué)者萊尼茨爾（年，澳大利亞植物學(xué)者萊尼茨爾（ReinitzerReinitzer）研）研究膽甾醇在植物中的作用時(shí)，用膽甾基苯進(jìn)行試驗(yàn)，無(wú)意究膽甾醇在植物中的作用時(shí)，用膽甾基苯進(jìn)行試驗(yàn)，無(wú)意間發(fā)現(xiàn)了液

4、晶，但液晶的實(shí)際應(yīng)用直到二十世紀(jì)五十年代間發(fā)現(xiàn)了液晶，但液晶的實(shí)際應(yīng)用直到二十世紀(jì)五十年代才開(kāi)始。才開(kāi)始。 顧名思義，液晶是固液態(tài)之間的一種中間類狀態(tài)。顧名思義，液晶是固液態(tài)之間的一種中間類狀態(tài)。 液晶是一種有機(jī)化合物，在一定的溫度范圍內(nèi)，它既具有液晶是一種有機(jī)化合物，在一定的溫度范圍內(nèi)，它既具有液體的流動(dòng)性、粘度、形變等機(jī)械性質(zhì)，又具有晶體的熱液體的流動(dòng)性、粘度、形變等機(jī)械性質(zhì)，又具有晶體的熱（熱效應(yīng)）、光（光學(xué)各向異性）、電（電光效應(yīng)）、磁（熱效應(yīng)）、光（光學(xué)各向異性）、電（電光效應(yīng)）、磁（磁光效應(yīng)）等物理性質(zhì)。（磁光效應(yīng)）等物理性質(zhì)。 光線穿透液晶的路徑由構(gòu)成它光線穿透液晶的路徑由構(gòu)成它

5、的分子排列所決定。人們發(fā)現(xiàn)給液晶充電會(huì)改變它的分子的分子排列所決定。人們發(fā)現(xiàn)給液晶充電會(huì)改變它的分子排列，繼而造成光線的扭曲或折射。排列，繼而造成光線的扭曲或折射。 液晶按照分子結(jié)構(gòu)排列的不同，分為三種：晶體顆粒粘液晶按照分子結(jié)構(gòu)排列的不同，分為三種：晶體顆粒粘土狀的稱為近晶相（土狀的稱為近晶相（SmecticSmectic）液晶、類似細(xì)火柴棒的稱為）液晶、類似細(xì)火柴棒的稱為向列相（向列相（NematicNematic）液晶、類似膽固醇狀的稱為膽甾相）液晶、類似膽固醇狀的稱為膽甾相（CholesticCholestic）液晶。這三種液晶的物理特性都不盡相同，）液晶。這三種液晶的物理特性都不盡相

6、同，用于液晶顯示器的是第二類的向列相（用于液晶顯示器的是第二類的向列相（NematicNematic）液晶）液晶 P.7P.8TFT-LCD工作原理工作原理 P.9TFT-LCD工作原理工作原理 液晶是一種有機(jī)復(fù)合物，由長(zhǎng)棒狀的分子構(gòu)成。在自然狀液晶是一種有機(jī)復(fù)合物，由長(zhǎng)棒狀的分子構(gòu)成。在自然狀態(tài)下，這些棒狀分子的長(zhǎng)軸大致平行。態(tài)下，這些棒狀分子的長(zhǎng)軸大致平行。LCDLCD第一個(gè)特點(diǎn)是必須將第一個(gè)特點(diǎn)是必須將液晶灌入兩個(gè)列有細(xì)槽的平面之間才能正常工作。這兩個(gè)平面上液晶灌入兩個(gè)列有細(xì)槽的平面之間才能正常工作。這兩個(gè)平面上的槽互相垂直的槽互相垂直(90(90度相交度相交) )，也就是說(shuō)，若一個(gè)平面

7、上的分子南北，也就是說(shuō)，若一個(gè)平面上的分子南北向排列，則另一平面上的分子?xùn)|西向排列，而位于兩個(gè)平面之間向排列，則另一平面上的分子?xùn)|西向排列，而位于兩個(gè)平面之間的分子被強(qiáng)迫進(jìn)入一種的分子被強(qiáng)迫進(jìn)入一種9090度扭轉(zhuǎn)的狀態(tài)。由于光線順著分子的排度扭轉(zhuǎn)的狀態(tài)。由于光線順著分子的排列方向傳播，所以光線經(jīng)過(guò)液晶時(shí)也被扭轉(zhuǎn)列方向傳播，所以光線經(jīng)過(guò)液晶時(shí)也被扭轉(zhuǎn)9090度。但當(dāng)液晶上加度。但當(dāng)液晶上加一個(gè)電壓時(shí)，分子便會(huì)重新垂直排列，使光線能直射出去，而不一個(gè)電壓時(shí)，分子便會(huì)重新垂直排列，使光線能直射出去，而不發(fā)生任何扭轉(zhuǎn)。發(fā)生任何扭轉(zhuǎn)。LCDLCD的第二個(gè)特點(diǎn)是它依賴極化濾光片和光線本的第二個(gè)特點(diǎn)是它依賴

8、極化濾光片和光線本身，自然光線是朝四面八方隨機(jī)發(fā)散的，極化濾光片實(shí)際是一系身，自然光線是朝四面八方隨機(jī)發(fā)散的，極化濾光片實(shí)際是一系列越來(lái)越細(xì)的平行線。這些線形成一張網(wǎng)，阻斷不與這些線平行列越來(lái)越細(xì)的平行線。這些線形成一張網(wǎng)，阻斷不與這些線平行的所有光線，極化濾光片的線正好與第一個(gè)垂直，所以能完全阻的所有光線，極化濾光片的線正好與第一個(gè)垂直，所以能完全阻斷那些已經(jīng)極化的光線。斷那些已經(jīng)極化的光線。 只有兩個(gè)濾光片的線完全平行，或者只有兩個(gè)濾光片的線完全平行，或者光線本身已扭轉(zhuǎn)到與第二個(gè)極化濾光片相匹配，光線才得以穿透。光線本身已扭轉(zhuǎn)到與第二個(gè)極化濾光片相匹配，光線才得以穿透。LCDLCD正是由這

9、樣兩個(gè)相互垂直的極化濾光片構(gòu)成，所以在正常情正是由這樣兩個(gè)相互垂直的極化濾光片構(gòu)成，所以在正常情況下應(yīng)該阻斷所有試圖穿透的光線。但是，由于兩個(gè)濾光片之間況下應(yīng)該阻斷所有試圖穿透的光線。但是，由于兩個(gè)濾光片之間充滿了扭曲液晶，所以在光線穿出第一個(gè)濾光片后，會(huì)被液晶分充滿了扭曲液晶，所以在光線穿出第一個(gè)濾光片后，會(huì)被液晶分子扭轉(zhuǎn)子扭轉(zhuǎn)9090度，最后從第二個(gè)濾光片中穿出。另一方面，若為液晶度，最后從第二個(gè)濾光片中穿出。另一方面，若為液晶加一個(gè)電壓，分子又會(huì)重新排列并完全平行，使光線不再扭轉(zhuǎn)，加一個(gè)電壓，分子又會(huì)重新排列并完全平行，使光線不再扭轉(zhuǎn)，所以正好被第二個(gè)濾光片擋住?？傊?，加電將光線阻斷，不

10、加電所以正好被第二個(gè)濾光片擋住?？傊?，加電將光線阻斷，不加電則使光線射出。當(dāng)然，也可以改變則使光線射出。當(dāng)然，也可以改變LCDLCD中的液晶排列，使光線在中的液晶排列，使光線在加電時(shí)射出，而不加電時(shí)被阻斷。但由于液晶屏幕幾乎總是亮著加電時(shí)射出，而不加電時(shí)被阻斷。但由于液晶屏幕幾乎總是亮著的，所以只有的，所以只有 加電將光線阻斷加電將光線阻斷 的方案才能達(dá)到最省電的目的。的方案才能達(dá)到最省電的目的。 P.10TFT-LCD工作原理工作原理P.11TFT-LCD工作原理工作原理P.12TFT-LCD製作流程製作流程P.13 TFT-LCD製作流程製作流程TFT Process P.14 TFT-L

11、CD製作流程製作流程TFT Process P.15TFT-LCD製作流程製作流程TFT Process P.16process and processing steps are quite similar to that of the semiconductor industry. Deposition, photolithography and etching steps are common to both industries. The key differences are that the TFT is built on a glass substrate instead of a

12、 silicon wafer. In addition, the TFT requires a processing temperature ranging from approximately 300 to 500? compared to about 1,000?required for semiconductor fabrication. 1. PECVD (Plasma Enhanced Chemical Vapor Deposition) Process Before gas enters the chamber, the state of the vacuum is maintai

13、ned and the glass plate is heated to a specific temperature. When gas flows into the chamber, the RF voltage is applied from electrodes inside the chamber, which transform gas into a plasma state. From this plasma, precursors are formed and deposited on the glass substrate. 2. Sputtering Process Spu

14、ttering is the process wherein the gas ion, which is the high energy inside the plasma created by RF power or DC power collides with the target surface, resulting in the deposition of the target material on the plate. Generally, the target materials are mounted on the negative electrode surface. The

15、n, the sputtered target materials are deposited on the plate, which is put on the positive electrode. For sputtering, inactive gases are used, such as helium and argon, so that deposition material chemistry is not affected. P.173. Photolithography Process Photolithography is the transfer of a patter

16、n from the photo mask onto a substrate. The photolithography process begins when the substrate is coated with an extremely thin liquid film of photosensitive material, called photoresis. The light then exposes the photoresist, some of which is destroyed when exposed to the light. The unnecessary por

17、tion of the material is then cleaned from the surface through another process, leaving an extremely fine pattern behind. Another layer of the photoresist is then deposited to the substrate, exposed, cleaned, until all the layers have been printed or imaged onto the surface. The photolithography proc

18、ess is a critical step within the LCD manufacturing process because panel quality depends on the entire pattern formation. As such, it is extremely sensitive to particles and other forms of contamination. Thus, this process requires a special clean environment, commonly referred to as a clean room,

19、and precise control of equipment, chemicals and materials. In the future, this will prove increasingly important as advanced displays that offer greater functionality and higher performance will require increasingly complex and stringent manufacturing capabilities. 4. Dry etch Process The dry etch p

20、rocess uses reactive species, such as atoms or radicals from the gas plasma, to etch away a portion of the object material. When these species react with the material located on the plate, the open region of material transforms into a volatile state and is removed from the matrix. In this process, t

21、he reaction velocity is fast and fine patterns can be formed uniformly.P.18TFT-LCD製作流程製作流程Color Filter Process P.19TFT-LCD製作流程製作流程Cell Process P.20LCD production process can be described as follows:(1) the orientation layer on the lower and upper plate is formed;(2) the layer is properly positioned

22、so that the liquid crystal can properly align; (3) the spacer is dispensed, the seal is printed, and the two plates are assembled; (4) the liquid crystal is injected into the cell through the capillary effect; and (5) the injection hole is sealed.1. Printing the Orientation Layer The orientation lay

23、er is evenly spread on the pixel area of the upper and lower plate. The polyimide is spread on the drum thinly and evenly and is coated on the rubber plate, which has been patterned in advance. In turn, the polyimide is printed on the upper color filter or the lower TFT-array plate. After printing,

24、the polyimide is hardened through the process of annealing. 2. Rubbing Rubbing is the process that forms the straight groove on the hardened polyimide in a fixed direction in order to make the liquid crystal orient in a fixed direction. The straight groove can be formed by rubbing the panel in a cer

25、tain direction with the rubbing velvet attached to the rotating drum. P.21 3. Dispensing SpacersThe spacers are dispensed evenly in order to secure the fixed cell gap when assembling the upper and lower plate. After the spacers are mixed in the liquid with the proper concentration, they are then tra

26、nsported to the spray nozzle through the pump, and subsequently sprayed on the surface of the plate from the nozzle with high pressure. Heating dries the liquid, and the density of the spacer is adjusted between 100 ea/ and 200 ea/ according to the display size. The spacer shape is like a ball with

27、a diameter size between 4 and 5 which determines the cell gap between the plates. 4. Injecting the Liquid Crystal The liquid crystal is injected between the upper and lower plate using capillary action and pressure differences after the upper and lower plate are assembled. The process system consist

28、s of a vacuum pump, vacuum chamber, an up/down moving device, a jig, which contains the liquid crystal, and, an N system. At first, the internal cell vacuum level is maintained at about 10-3 Torr from the original vacuum state. The liquid crystal is then pulled into the cell by the capillary effect.

29、 When the cell is filled with liquid crystal up to about 80 percent , N?s then purged into the vacuum chamber slowly and the liquid crystal fills the remaining space in the cell as a result of the difference in pressure from inside and outside the cell. P.22TFT-LCD製作流程製作流程Module Process The module p

30、rocess is the step that determines the final quality of the product to be delivered to the customer. The step is completed once the polarizer, the drive IC, PCB, backlight unit and the frame are assembled. P.2310mm10mm10mm10mm1/4 H1/2 H3/4 H1/4 V1/2 V3/4 VY1Y11Y5Y4Y2Y12Y13Y8Y7Y6Y3Y9Y10a. 規(guī)格條件：(1)中心點(diǎn)

31、 (2)五點(diǎn)平均b. 影響亮度的因素 (1) Cell穿透率(開(kāi)口率) (2) Gamma Curve (3) BL發(fā)光效率 (4) 燈管電流P.24 Luminance of all pixels White(L255)Luminance of all pixels Dark(L0)L255(or L63)L0CR=P.25 LCD的最大分辨率就是它的真實(shí)分辨率，也就是最佳分辨率。P.26CR10 (W/B) 液晶顯示器的可視角度包括水平可視角度和垂直可視角度兩個(gè)指標(biāo)液晶顯示器的可視角度包括水平可視角度和垂直可視角度兩個(gè)指標(biāo)：水平可視角度表示以顯示器的垂直法線水平可視角度表示以顯示器的垂直法

32、線( (即顯示器正中間的垂直假想即顯示器正中間的垂直假想線線) )為準(zhǔn)，在垂直于法線左方或右方一定角度的位置上仍然能夠正常的為準(zhǔn)，在垂直于法線左方或右方一定角度的位置上仍然能夠正常的看見(jiàn)顯示圖像，這個(gè)角度范圍就是液晶顯示器的水平可視角度；同樣如看見(jiàn)顯示圖像，這個(gè)角度范圍就是液晶顯示器的水平可視角度；同樣如果以水平法線為準(zhǔn)，上下的可視角度就稱為垂直可視角度。一般而言，果以水平法線為準(zhǔn)，上下的可視角度就稱為垂直可視角度。一般而言，可視角度是以對(duì)比度變化為參照標(biāo)準(zhǔn)的。當(dāng)觀察角度加大時(shí)，該位置看可視角度是以對(duì)比度變化為參照標(biāo)準(zhǔn)的。當(dāng)觀察角度加大時(shí)，該位置看到的顯示圖像的對(duì)比度會(huì)下降，而當(dāng)角度加大到一定

33、程度，對(duì)比度下降到的顯示圖像的對(duì)比度會(huì)下降，而當(dāng)角度加大到一定程度，對(duì)比度下降到到101101時(shí)，這個(gè)角度就是該液晶顯示器的最大可視角。一般主流時(shí)，這個(gè)角度就是該液晶顯示器的最大可視角。一般主流LCDLCD的的可視角度為可視角度為120160120160度。比較理想的可視角度應(yīng)在度。比較理想的可視角度應(yīng)在175175度以上（水平度以上（水平).).P.27 帶寬是指每秒鐘掃描過(guò)的圖像點(diǎn)的個(gè)數(shù)，以帶寬是指每秒鐘掃描過(guò)的圖像點(diǎn)的個(gè)數(shù)，以MHz(MHz(兆赫茲兆赫茲) )為單位，表明了顯示器電路可以處理的頻率范圍。為單位，表明了顯示器電路可以處理的頻率范圍。讓我們舉例說(shuō)明。比如，在標(biāo)準(zhǔn)讓我們舉例說(shuō)明。比如，在標(biāo)準(zhǔn)VGAVGA方式下，如果刷新頻率為方式下，如果刷新頻率為60Hz60Hz，則需要的帶寬為，則需要的帶寬為640640480480606018.4MHz18.4MHz；在；在10241024768768的分的分辨率下，若刷新頻率為辨率下，若刷新頻率為70Hz70Hz，則需要的帶寬為，則需要的帶寬為55.1MHz55.1MHz。以上的數(shù)。以上的數(shù)據(jù)是理論值，實(shí)際所需的帶寬要高一些。據(jù)是理論值，實(shí)際所需的帶寬要高一些。早期的顯示器是固定頻率的，現(xiàn)在的多頻顯示器采用自動(dòng)跟蹤早期的顯示器是固定頻率的，現(xiàn)在的多頻顯示器采用自動(dòng)跟蹤技術(shù)，使顯示器的掃描頻率自動(dòng)與顯示卡的輸出同步，從而實(shí)現(xiàn)了技