DRAMprocessflowPPT學(xué)習(xí)教案

1、會(huì)計(jì)學(xué)1DRAMprocessflowDRAM Architecture第1頁(yè)/共25頁(yè)DRAM Cell OperationWrite (“1”):Bitline (Vcc)Wordline (1.5Vcc)CapacitorVrefRead:Wordline (1.5Vcc)CapacitorVrefBitline (1/2Vcc)Bitline (1/2Vcc)SA“1” or “0”QQ第2頁(yè)/共25頁(yè) DRY ETCH (Oxide/Silicon)* ASH Zero MARK AEI Zero MARK DEPTH ProfilePERIPHERAL CROSS SECTION

2、Wafer Start Zero MARK OX Zero MARK Photo MARKPR第3頁(yè)/共25頁(yè)AA Oxide Growth AA SiN Dep. AA Photo AA Photo CD AA ADI AA Dry ETCH* AA ASH AA Post-clean AA ETCH CD AA DepthCELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONPRE- OXIDE SiN SiN SiNPRE- OXIDESTISTISTISTISTI Profile & Defect第4頁(yè)/共25頁(yè)P(yáng)RE- OXIDESTISTI

3、STIPRE- OXIDESiNSiNHDP Gap Fill STI HDP Dep. STI CMP STI SiN RemovalPRE- OXIDESiNSiNHDP Gap Fill第5頁(yè)/共25頁(yè)STI SAC Oxidation N-Well Photo N-Well Overlay N-Well ADICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONP-TYPE SUBSTRATESTISTISTI N-Well IMP N-Well ASH N-Well AEIN-WellPRPRSTI第6頁(yè)/共25頁(yè) P-Well Photo

4、 P-Well Overlay P-Well ADI P-Well IMP P-WELL ASHSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONP-TYPE SUBSTRATESTISTISTIN-WellPRPRSTIP-Well第7頁(yè)/共25頁(yè) CELL ASH Cell AEI Cell Photo Cell Overlay Cell N-Well IMP Cell P-Well IMPSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellPRSTIP-We

5、llN-WellP-Well第8頁(yè)/共25頁(yè) P1 Gate Oxidation P1 Poly Dep. P1 WSi Dep. P1 ARC P1 SiN P1 Photo (Q-time) Pl Overlay P1 ADI CD Dummy P1 NIT Etch (Q-time) P1 POLY Etch * P1 ASH P1 Post-clean P1 ROX THK P1 AEI CD PRPRPRPRPRPRSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellSTIP-WellN-WellP-We

6、ll Profile & Defect第9頁(yè)/共25頁(yè) SP SiN Etch SP Post Etch CLN SP Ox. SP SiN Dep. STICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellSTIP-WellN-WellP-Well第10頁(yè)/共25頁(yè) P+ S/D ADI P+ S/D IMP P+ ASH P+ S/D AEIPRPRSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellSTIP-WellN-WellP-W

7、ell S/D OX P+ S/D Photo P+ S/D Overlay 第11頁(yè)/共25頁(yè) N+ S/D Photo N+ S/D Overlay N+ S/D ADI N+ S/D IMP N+ ASH N+ S/D AEIPRPRSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellSTIP-WellN-WellP-WellPR第12頁(yè)/共25頁(yè) C1 Photo C1 Overlay C1 CD C1 ADI C1 Etch C1 SiN Dep. C1 BP-TEOS C1 BP-TEOS CMP C1

8、 ASH C1 Si-RECESS ETCH C1 AEI CD C1 AEIPRSTICELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTISTIN-WellSTIP-WellN-WellP-Well第13頁(yè)/共25頁(yè) C2 ADI CD C2 ADI C2 Etch C2 AEI CD C2 BP-TEOS C2 Photo C2 Overlay P2P2P2PRCELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONSTISTIN-WellSTIP-WellSTISTIN-WellP-Well

9、P2 CMP P2 CMP THK P2 Poly Dep. 第14頁(yè)/共25頁(yè) ONO SiN Pre-clean ONO SiN Dep. ONO SiN OX P3 Pre-clean P3 Dep. R-Poly Dep. R-Poly CMPCELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTIONN-WellP-WellCellP2P2P2STISTISTISTISTI第15頁(yè)/共25頁(yè)CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION P4 Photo P4 Overlay P4 ADI CD P

10、4 Etch P4 ASH P4 AEI CD P4 Dep. N-WellP-WellCellP2P2P2STISTISTISTISTI第16頁(yè)/共25頁(yè)N-WellP-WellCellP2P2P2CT1CO2CO2CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION CT2 Etch CT2 ASH CT2 CD CT2 AEI CT2 Photo CT2 Overlay CT2 CD CT2 ADICT2CT2CT2STISTISTISTISTI CT1 Overlay CT1 CD CT1 ADI CT1 Etch CT1 ASH CT1 C

11、D CT1 BP-TEOS Dep. CT1 Photo 第17頁(yè)/共25頁(yè) M1 ARC M1 ASHCELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION M1 Ti / TiN M1 W-CVD N-WellP-WellCellP2P2P2ILDSTISTISTISTISTI M1 Photo M1 Overlay M1 CD M1 ADI M1 Etch M1 ASH M1 CD-Etch M1 AEI第18頁(yè)/共25頁(yè)CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION VIA1 Photo VIA

12、1 Overlay VIA1 CD VIA1 ADI VIA1 Etch VIA1 CD VIA1 AEIN-WellP-WellCellP2P2P2V1IMD1STISTISTISTISTI IMD1 OX. IMD1 THK IMD1 CMP IMD1 Post CMP THK 第19頁(yè)/共25頁(yè)CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION M2 Photo M2 Overlay M2 CD M2 ADI M2 Etch M2 ASH M2 CD M2 AEIN-WellP-WellCellP2P2P2IMD1STISTISTISTIST

13、I M2 Ti/TiN M2 W-Plug M2 W-Plug CMP M2 AL Dep. (Ti/TiN/AlCu/TiN)第20頁(yè)/共25頁(yè)CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION VIA2 Photo VIA2 Overlay VIA2 CD VIA2 ADI VIA2 Etch VIA2 ASH VIA2 CD VIA2 AEIN-WellP-WellCellP2P2P2V2IMD2IMD2STISTISTISTISTI IMD2 Ox. IMD2 THK IMD2 CMP IMD2 Post CMP THK第21頁(yè)/共25頁(yè)C

14、ELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION M3 Photo M3 Overlay M3 CD M3 ADI M3 Etch M3 ASH M3 CD-Etch M3 AEIN-WellP-WellCellP2P2P2IMD2IMD2 M3STISTISTISTISTI M3 Ti/TiN M3 W-Plug M3 W-Plug CMP M3 AL Dep. (Ti/TiN/AlCu/TiN)第22頁(yè)/共25頁(yè)CELL ARRAY CROSS SECTIONPERIPHERAL CROSS SECTION Polymide Coat Polymide Coat ADI Polymide Photo Polymide ADI Polymide ASH WAT (Wafer Acceptance Test)FOXN-WellP-WellCellP2P2P2PIPIPIPASS-2PASS-2PASS-1PASS